IPM RAS / Structure / Staff / Svechnikov Mikhail

Svechnikov Mikhail

Researcher in the laboratory for the basics of the nanoelectronic component base of information technology (181)

Personal information

Born March 30, 1991

Research interests

X-ray optics; Multilayer X-ray mirrors; Physics of surface and thin films; Sources of X-ray radiation

Education

  1. 2008 — graduated from school № 2, Dzerzhinsk, Nizhni Novgorod region
  2. 2008−2014 — student of the ASGAP department of Lobachevsky State University of Nizhni Novgorod (UNN)
  3. 2014−2018 — post-graduate course in IPM RAS
  4. 2018 — defended the PhD thesis «Diagnostics of the internal structure of multilayer X-ray mirrors according to reflectometry data in the framework of the extended model»

Career

  1. 2012−2014 — laboratory assistant in IPM RAS, student of the interfaculty base chair «Physics of nanostructures and nanoelectronics»
  2. 2014−2019 — junior researcher in IPM RAS
  3. 2019−н. в. — researcher in IPM RAS

Publications

  1. Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength / N. I. Chkhalo, D. E. Pariev, V. N. Polkovnikov, N. N. Salashchenko, R. A. Shaposhnikov, I. L. Stroulea, M. V. Svechnikov, Y. A. Vainer, and S. Y. Zuev, Thin Solid Films 631, 106−111 (2017)
  2. High-reflection Mo/Be/Si multilayers for EUV lithography / N.I. Chkhalo, S.A. Gusev, A.N. Nechay, D.E. Pariev, V.N. Polkovnikov, N.N. Salashchenko, F. Schäfers, M.G. Sertsu, A. Sokolov, M.V. Svechnikov, D.A. Tatarsky, Optics Letters 42, 5070 (2017)
  3. Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data / M. Svechnikov, D. Pariev, A. Nechay, N. Salashchenko, N. Chkhalo, Y. Vainer, and D. Gaman, J. Appl. Crystallogr. 50, 1428−1440 (2017)
  4. Study of oxidation processes in Mo/Be multilayers / A. N. Nechay, N. I. Chkhalo, M. N. Drozdov, S. A. Garakhin, D. E. Pariev, V. N. Polkovnikov, N. N. Salashchenko, M. V. Svechnikov, Y. A. Vainer, E. Meltchakov, and F. Delmotte, AIP Adv. 8 (7), 075202 (2018)
  5. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography / M. V. Svechnikov, N. I. Chkhalo, S. A. Gusev, A. N. Nechay, D. E. Pariev, A. E. Pestov, V. N. Polkovnikov, D. A. Tatarskiy, N. N. Salashchenko, F. Schäfers, M. G. Sertsu, A. Sokolov, Y. A. Vainer, and M. V. Zorina, Opt. Express 26, 33718−33731 (2018)
  6. Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm / Vladimir N. Polkovnikov, Nikolai I. Chkhalo, Roman S. Pleshkov, Nikolai N. Salashchenko, Franz Schäfers, Mewael G. Sertsu, Andrey Sokolov, Mikhail V. Svechnikov, and Sergei Yu. Zuev, Opt. Lett. 44, 263−266 (2019)

Contacts

Phone: (831) 417−94−76 (+122)
E-mail: svechnikov@ipmras.ru, svechnikovmv@gmail.com

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